PMC:7143804 / 63038-63263 JSONTXT

{"project":"LitCovid-PD-CLO","denotations":[{"id":"T486","span":{"begin":23,"end":27},"obj":"http://purl.obolibrary.org/obo/UBERON_0000473"},{"id":"T487","span":{"begin":73,"end":76},"obj":"http://purl.obolibrary.org/obo/CLO_0007052"}],"text":"Material Method Tape Test Initial TCR\nBefore After Resistance [Ω] K−1\nAu Evaporation + − 5.0 0.00161\nAu Sputtering + + 8.2 0.00192\nPt Evaporation + + 400 ∗ −0.00440 ∗\nPt Sputtering + +/− 6.8 0.00207"}

{"project":"LitCovid-PD-CHEBI","denotations":[{"id":"T88763","span":{"begin":77,"end":79},"obj":"Chemical"},{"id":"T132","span":{"begin":113,"end":115},"obj":"Chemical"},{"id":"T33445","span":{"begin":148,"end":150},"obj":"Chemical"},{"id":"T135","span":{"begin":189,"end":191},"obj":"Chemical"}],"attributes":[{"id":"A19474","pred":"chebi_id","subj":"T88763","obj":"http://purl.obolibrary.org/obo/CHEBI_29287"},{"id":"A17017","pred":"chebi_id","subj":"T132","obj":"http://purl.obolibrary.org/obo/CHEBI_29287"},{"id":"A19844","pred":"chebi_id","subj":"T33445","obj":"http://purl.obolibrary.org/obo/CHEBI_33364"},{"id":"A46997","pred":"chebi_id","subj":"T33445","obj":"http://purl.obolibrary.org/obo/CHEBI_75318"},{"id":"A67419","pred":"chebi_id","subj":"T135","obj":"http://purl.obolibrary.org/obo/CHEBI_33364"},{"id":"A48552","pred":"chebi_id","subj":"T135","obj":"http://purl.obolibrary.org/obo/CHEBI_75318"}],"text":"Material Method Tape Test Initial TCR\nBefore After Resistance [Ω] K−1\nAu Evaporation + − 5.0 0.00161\nAu Sputtering + + 8.2 0.00192\nPt Evaporation + + 400 ∗ −0.00440 ∗\nPt Sputtering + +/− 6.8 0.00207"}

{"project":"LitCovid-sentences","denotations":[{"id":"T579","span":{"begin":0,"end":41},"obj":"Sentence"},{"id":"T580","span":{"begin":42,"end":76},"obj":"Sentence"},{"id":"T581","span":{"begin":77,"end":112},"obj":"Sentence"},{"id":"T582","span":{"begin":113,"end":147},"obj":"Sentence"},{"id":"T583","span":{"begin":148,"end":188},"obj":"Sentence"},{"id":"T584","span":{"begin":189,"end":225},"obj":"Sentence"}],"namespaces":[{"prefix":"_base","uri":"http://pubannotation.org/ontology/tao.owl#"}],"text":"Material Method Tape Test Initial TCR\nBefore After Resistance [Ω] K−1\nAu Evaporation + − 5.0 0.00161\nAu Sputtering + + 8.2 0.00192\nPt Evaporation + + 400 ∗ −0.00440 ∗\nPt Sputtering + +/− 6.8 0.00207"}