PMC:7143804 / 59969-60386 JSONTXT

{"project":"LitCovid-PubTator","denotations":[{"id":"483","span":{"begin":48,"end":50},"obj":"Chemical"}],"attributes":[{"id":"A483","pred":"tao:has_database_id","subj":"483","obj":"MESH:D006046"}],"namespaces":[{"prefix":"Tax","uri":"https://www.ncbi.nlm.nih.gov/taxonomy/"},{"prefix":"MESH","uri":"https://id.nlm.nih.gov/mesh/"},{"prefix":"Gene","uri":"https://www.ncbi.nlm.nih.gov/gene/"},{"prefix":"CVCL","uri":"https://web.expasy.org/cellosaurus/CVCL_"}],"text":"Figure 11 Characterization of the 100 nm thick Au heater structure deposited by sputtering using the two sequential shadow masks. Panel (a) depicts the thermal images on the other side of the 1.5 mm thick substrate, while operating the heater at different input powers. (b) The graph with the recorded heat profiles of panel (a). Panel (c) shows the durability test in which a constant potential is applied for 25 h."}

{"project":"LitCovid-PD-CLO","denotations":[{"id":"T455","span":{"begin":7,"end":9},"obj":"http://purl.obolibrary.org/obo/CLO_0053733"},{"id":"T456","span":{"begin":138,"end":139},"obj":"http://purl.obolibrary.org/obo/CLO_0001020"},{"id":"T457","span":{"begin":272,"end":273},"obj":"http://purl.obolibrary.org/obo/CLO_0001021"},{"id":"T458","span":{"begin":327,"end":328},"obj":"http://purl.obolibrary.org/obo/CLO_0001020"},{"id":"T459","span":{"begin":362,"end":366},"obj":"http://purl.obolibrary.org/obo/UBERON_0000473"},{"id":"T460","span":{"begin":376,"end":377},"obj":"http://purl.obolibrary.org/obo/CLO_0001020"}],"text":"Figure 11 Characterization of the 100 nm thick Au heater structure deposited by sputtering using the two sequential shadow masks. Panel (a) depicts the thermal images on the other side of the 1.5 mm thick substrate, while operating the heater at different input powers. (b) The graph with the recorded heat profiles of panel (a). Panel (c) shows the durability test in which a constant potential is applied for 25 h."}

{"project":"LitCovid-PD-CHEBI","denotations":[{"id":"T50722","span":{"begin":48,"end":50},"obj":"Chemical"}],"attributes":[{"id":"A49447","pred":"chebi_id","subj":"T50722","obj":"http://purl.obolibrary.org/obo/CHEBI_29287"}],"text":"Figure 11 Characterization of the 100 nm thick Au heater structure deposited by sputtering using the two sequential shadow masks. Panel (a) depicts the thermal images on the other side of the 1.5 mm thick substrate, while operating the heater at different input powers. (b) The graph with the recorded heat profiles of panel (a). Panel (c) shows the durability test in which a constant potential is applied for 25 h."}

{"project":"LitCovid-sentences","denotations":[{"id":"T540","span":{"begin":0,"end":130},"obj":"Sentence"},{"id":"T541","span":{"begin":131,"end":330},"obj":"Sentence"},{"id":"T542","span":{"begin":331,"end":417},"obj":"Sentence"}],"namespaces":[{"prefix":"_base","uri":"http://pubannotation.org/ontology/tao.owl#"}],"text":"Figure 11 Characterization of the 100 nm thick Au heater structure deposited by sputtering using the two sequential shadow masks. Panel (a) depicts the thermal images on the other side of the 1.5 mm thick substrate, while operating the heater at different input powers. (b) The graph with the recorded heat profiles of panel (a). Panel (c) shows the durability test in which a constant potential is applied for 25 h."}