PMC:7143804 / 33641-34374
Annnotations
LitCovid-PubTator
{"project":"LitCovid-PubTator","denotations":[{"id":"237","span":{"begin":55,"end":60},"obj":"Chemical"},{"id":"238","span":{"begin":113,"end":118},"obj":"Chemical"},{"id":"239","span":{"begin":648,"end":651},"obj":"Chemical"},{"id":"240","span":{"begin":718,"end":720},"obj":"Chemical"},{"id":"241","span":{"begin":725,"end":727},"obj":"Chemical"}],"attributes":[{"id":"A237","pred":"tao:has_database_id","subj":"237","obj":"MESH:D008670"},{"id":"A238","pred":"tao:has_database_id","subj":"238","obj":"MESH:D008670"},{"id":"A240","pred":"tao:has_database_id","subj":"240","obj":"MESH:D006046"},{"id":"A241","pred":"tao:has_database_id","subj":"241","obj":"MESH:D010984"}],"namespaces":[{"prefix":"Tax","uri":"https://www.ncbi.nlm.nih.gov/taxonomy/"},{"prefix":"MESH","uri":"https://id.nlm.nih.gov/mesh/"},{"prefix":"Gene","uri":"https://www.ncbi.nlm.nih.gov/gene/"},{"prefix":"CVCL","uri":"https://web.expasy.org/cellosaurus/CVCL_"}],"text":"Normally, heating up a glass or Si substrate with thin metal strips while measuring the resistance (RT) in these metal strips at certain temperature intervals (T) yields directly a linear relation, which can be fitted with RT/R0=1+αT−T0 [64], in which α is the the temperature coefficient of resistance (TCR) value. The thin-film TCR values have to be measured as they differ from the bulk TCR values due to its dependency on layer purity, grain size, and deposition method [65,66]. Belser and Hicklin also lists other attributes, such as surface roughness, porosity, and adsorbed materials present in or on the substrate which could influence the TCR value [64]. The bulk TCR values are 0.0034 K−1 and 0.0037 K−1 for Au and Pt [67]."}
LitCovid-PD-CLO
{"project":"LitCovid-PD-CLO","denotations":[{"id":"T220","span":{"begin":21,"end":22},"obj":"http://purl.obolibrary.org/obo/CLO_0001020"},{"id":"T221","span":{"begin":179,"end":180},"obj":"http://purl.obolibrary.org/obo/CLO_0001020"},{"id":"T222","span":{"begin":695,"end":698},"obj":"http://purl.obolibrary.org/obo/CLO_0007052"},{"id":"T223","span":{"begin":710,"end":713},"obj":"http://purl.obolibrary.org/obo/CLO_0007052"},{"id":"T224","span":{"begin":725,"end":731},"obj":"http://purl.obolibrary.org/obo/CLO_0008516"}],"text":"Normally, heating up a glass or Si substrate with thin metal strips while measuring the resistance (RT) in these metal strips at certain temperature intervals (T) yields directly a linear relation, which can be fitted with RT/R0=1+αT−T0 [64], in which α is the the temperature coefficient of resistance (TCR) value. The thin-film TCR values have to be measured as they differ from the bulk TCR values due to its dependency on layer purity, grain size, and deposition method [65,66]. Belser and Hicklin also lists other attributes, such as surface roughness, porosity, and adsorbed materials present in or on the substrate which could influence the TCR value [64]. The bulk TCR values are 0.0034 K−1 and 0.0037 K−1 for Au and Pt [67]."}
LitCovid-PD-CHEBI
{"project":"LitCovid-PD-CHEBI","denotations":[{"id":"T221","span":{"begin":32,"end":34},"obj":"Chemical"},{"id":"T222","span":{"begin":718,"end":720},"obj":"Chemical"},{"id":"T223","span":{"begin":725,"end":727},"obj":"Chemical"}],"attributes":[{"id":"A221","pred":"chebi_id","subj":"T221","obj":"http://purl.obolibrary.org/obo/CHEBI_27573"},{"id":"A222","pred":"chebi_id","subj":"T222","obj":"http://purl.obolibrary.org/obo/CHEBI_29287"},{"id":"A223","pred":"chebi_id","subj":"T223","obj":"http://purl.obolibrary.org/obo/CHEBI_33364"},{"id":"A224","pred":"chebi_id","subj":"T223","obj":"http://purl.obolibrary.org/obo/CHEBI_75318"}],"text":"Normally, heating up a glass or Si substrate with thin metal strips while measuring the resistance (RT) in these metal strips at certain temperature intervals (T) yields directly a linear relation, which can be fitted with RT/R0=1+αT−T0 [64], in which α is the the temperature coefficient of resistance (TCR) value. The thin-film TCR values have to be measured as they differ from the bulk TCR values due to its dependency on layer purity, grain size, and deposition method [65,66]. Belser and Hicklin also lists other attributes, such as surface roughness, porosity, and adsorbed materials present in or on the substrate which could influence the TCR value [64]. The bulk TCR values are 0.0034 K−1 and 0.0037 K−1 for Au and Pt [67]."}
LitCovid-sentences
{"project":"LitCovid-sentences","denotations":[{"id":"T260","span":{"begin":0,"end":315},"obj":"Sentence"},{"id":"T261","span":{"begin":316,"end":482},"obj":"Sentence"},{"id":"T262","span":{"begin":483,"end":663},"obj":"Sentence"},{"id":"T263","span":{"begin":664,"end":733},"obj":"Sentence"}],"namespaces":[{"prefix":"_base","uri":"http://pubannotation.org/ontology/tao.owl#"}],"text":"Normally, heating up a glass or Si substrate with thin metal strips while measuring the resistance (RT) in these metal strips at certain temperature intervals (T) yields directly a linear relation, which can be fitted with RT/R0=1+αT−T0 [64], in which α is the the temperature coefficient of resistance (TCR) value. The thin-film TCR values have to be measured as they differ from the bulk TCR values due to its dependency on layer purity, grain size, and deposition method [65,66]. Belser and Hicklin also lists other attributes, such as surface roughness, porosity, and adsorbed materials present in or on the substrate which could influence the TCR value [64]. The bulk TCR values are 0.0034 K−1 and 0.0037 K−1 for Au and Pt [67]."}